Optical and Structural Properties of ZnO Thin Films Fabricated by SILAR Method | Abstract

ISSN ONLINE(2319-8753)PRINT(2347-6710)

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Optical and Structural Properties of ZnO Thin Films Fabricated by SILAR Method

Abstract

A novel and simple chemical route was used for the deposition of ZnO thin film from aqueous solution of zinc–ammonia complex, integrating the merits of successive ionic layer adsorption and reaction (SILAR) and chemical bath deposition methods. ZnO thin films on glass substrates were deposited with the precursor of zinc– ammonia complex. Characterization techniques of XRD, SEM, EDAX and DRS are used to characterize ZnO thin films. X-ray diffraction study show that the film prepared in this work exhibits good crystallinity with the hexagonal wurtzite crystalline structure and the preferential orientation along (0 0 2) plane, with a texture coefficient value of ~2.56, average crystallite size of 28.92 nm and with lattice constants a = b = 3.257 Å, c = 5.215 Å. EDAX spectrum indicates that the film consists of zinc and oxygen elements. The optical band gap energy of the thin films is calculated from optical absorption spectrometry using DRS data and the value was found to be direct allowed transition ~3.22 eV.

Hiten Sarma, Dhruba Chakrabortty, K.C. Sarma

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